FOCUSED ION-BEAM INDUCED DEPOSITION OF GOLD

被引：106

作者：

SHEDD, GM ^{[1
]}

LEZEC, H ^{[1
]}

DUBNER, AD ^{[1
]}

MELNGAILIS, J ^{[1
]}

机构：

[1] MIT,ELECTR RES LAB,CAMBRIDGE,MA 02139

来源：

APPLIED PHYSICS LETTERS | 1986年 / 49卷 / 23期

关键词：

D O I：

10.1063/1.97287

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1584 / 1586

页数：3

共 19 条

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[4]

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[6]

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[7]

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[8] INTEGRATED-CIRCUIT REPAIR USING FOCUSED ION-BEAM MILLING [J].

HARRIOTT, LR ;

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01) :181-184

[9] ALUMINUM-LINE CUTTING END-MONITOR UTILIZING SCANNING-ION-MICROSCOPE VOLTAGE-CONTRAST IMAGES [J].

ISHITANI, T ;

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TODOKORO, H .

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[10]

KAUFMAN HC, 1986, SPIE, V632, P60

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