共 9 条
[1]
Carter G., 1968, ION BOMBARDMENT SOLI
[2]
DEVELOPMENT OF BORON LIQUID-METAL-ION SOURCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1984, 2 (03)
:1365-1369
[3]
MASKLESS ETCHING OF A NANOMETER STRUCTURE BY FOCUSED ION-BEAMS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1983, 1 (04)
:985-989
[4]
FET FABRICATION USING MASKLESS ION-IMPLANTATION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1981, 19 (04)
:916-920
[5]
SELECTIVE SI AND BE IMPLANTATION IN GAAS USING A 100 KV MASS-SEPARATING FOCUSED ION-BEAM SYSTEM WITH AN AU-SI-BE LIQUID-METAL ION-SOURCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1983, 1 (04)
:1113-1116
[6]
100 KEV FOCUSED ION-BEAM SYSTEM WITH A EXB MASS FILTER FOR MASKLESS ION-IMPLANTATION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1983, 1 (04)
:1117-1120
[7]
SUB-MICRON CHANNEL MOSFET USING FOCUSED BORON ION-BEAM IMPLANTATION INTO SILICON
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
1984, 23 (08)
:L543-L545
[8]
TODOKORO H, 1983, SCANNING ELECTRON MI, V2, P561
[9]
A MASS-SEPARATING FOCUSED-ION-BEAM SYSTEM FOR MASKLESS ION-IMPLANTATION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1981, 19 (04)
:1158-1163