DEVELOPMENT OF BORON LIQUID-METAL-ION SOURCE

被引：29

作者：

ISHITANI, T

UMEMURA, K

HOSOKI, S

TAKAYAMA, S

TAMURA, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 03期

关键词：

D O I：

10.1116/1.572410

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1365 / 1369

页数：5

共 31 条

[1] FOCUSED SI ION-IMPLANTATION IN GAAS [J].

BAMBA, Y ;

MIYAUCHI, E ;

ARIMOTO, H ;

KURAMOTO, K ;

TAKAMORI, A ;

HASHIMOTO, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (10) :L650-L652

[2]

Brandon D. G., 1964, SURF SCI, V3, P1

[3] ION-BEAM ASSISTED MASKLESS ETCHING OF GAAS BY 50 KEV FOCUSED ION-BEAM [J].

GAMO, K ;

OCHIAI, Y ;

NAMBA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (12) :L792-L794

[4] CHARACTERISTICS OF BE-SI-AU TERNARY ALLOY LIQUID-METAL ION SOURCES [J].

GAMO, K ;

MATSUI, T ;

NAMBA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (11) :L692-L694

[5] LIQUID-METAL ALLOY ION SOURCES FOR B, SB, AND SI [J].

GAMO, K ;

UKEGAWA, T ;

INOMOTO, Y ;

OCHIAI, Y ;

NAMBA, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1182-1185

[6] B, AS AND SI FIELD-ION SOURCES [J].

GAMO, K ;

UKEGAWA, T ;

INOMOTO, Y ;

KA, KK ;

NAMBA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (10) :L595-L598

[7] MECHANISM OF LIQUID-METAL ELECTRON AND ION SOURCES [J].

GOMER, R .

APPLIED PHYSICS, 1979, 19 (04) :365-375

[8] DEVELOPMENT OF PHOSPHORUS LIQUID-METAL-ION SOURCE [J].

ISHITANI, T ;

UMEMURA, K ;

TAMURA, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (05) :L330-L332

[9] SCANNING MICROBEAM USING A LIQUID-METAL ION-SOURCE [J].

ISHITANI, T ;

TAMURA, H ;

TODOKORO, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (01) :80-83

[10] MASS-SEPARATED MICROBEAM SYSTEM WITH A LIQUID-METAL-ION SOURCE [J].

ISHITANI, T ;

UMEMURA, K ;

TAMURA, H .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3) :363-367

← 1 2 3 4 →