DEVELOPMENT OF PHOSPHORUS LIQUID-METAL-ION SOURCE

被引：17

作者：

ISHITANI, T

UMEMURA, K

TAMURA, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 05期

关键词：

D O I：

10.1143/JJAP.23.L330

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L330 / L332

页数：3

共 14 条

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[2] LIQUID-METAL ALLOY ION SOURCES FOR B, SB, AND SI [J].

GAMO, K ;

UKEGAWA, T ;

INOMOTO, Y ;

OCHIAI, Y ;

NAMBA, S .

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[3] B, AS AND SI FIELD-ION SOURCES [J].

GAMO, K ;

UKEGAWA, T ;

INOMOTO, Y ;

KA, KK ;

NAMBA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (10) :L595-L598

[4] MASS-SEPARATED MICROBEAM SYSTEM WITH A LIQUID-METAL-ION SOURCE [J].

ISHITANI, T ;

UMEMURA, K ;

TAMURA, H .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3) :363-367

[5] CARBON NEEDLE EMITTER FOR BORON AND ALUMINUM ION LIQUID-METAL-ION SOURCES [J].

ISHITANI, T ;

SHIMASE, A ;

TAMURA, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (05) :L277-L278

[6] ION-BEAM EXPOSURE APPARATUS USING A LIQUID-METAL SOURCE [J].

KOMURO, M .

THIN SOLID FILMS, 1982, 92 (1-2) :155-164

[7] FET FABRICATION USING MASKLESS ION-IMPLANTATION [J].

KUBENA, RL ;

ANDERSON, CL ;

SELIGER, RL ;

JULLENS, RA ;

STEVENS, EH ;

LAGNADO, I .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :916-920

[8] DRY DEVELOPMENT OF RESISTS EXPOSED TO FOCUSED GALLIUM ION-BEAM [J].

KUWANO, H ;

YOSHIDA, K ;

YAMAZAKI, SI .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (10) :L615-L617

[9] LATERAL SPREADS OF BE AND SI IN GAAS IMPLANTED WITH A MASKLESS ION-IMPLANTATION SYSTEM [J].

MIYAUCHI, E ;

ARIMOTO, H ;

BAMBA, Y ;

TAKAMORI, A ;

HASHIMOTO, H ;

UTSUMI, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (07) :L423-L425

[10]

SMITHELLS CJ, 1976, METAL REFERENCE BOOK, P587

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