CHARACTERISTICS OF BE-SI-AU TERNARY ALLOY LIQUID-METAL ION SOURCES

被引：18

作者：

GAMO, K

MATSUI, T

NAMBA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1983年 / 22卷 / 11期

关键词：

D O I：

10.1143/JJAP.22.L692

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L692 / L694

页数：3

共 14 条

[1] FIELD-ION EMISSION FROM LIQUID-TIN
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SUDRAUD, P
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[2] ENERGY SPREAD OF METAL-IONS DRAWN FROM THEIR LIQUID
DIXON, AJ
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1979, 12 (06) : L77 - L80
[3] ION-BEAM ASSISTED MASKLESS ETCHING OF GAAS BY 50 KEV FOCUSED ION-BEAM
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NAMBA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (12): : L792 - L794
[4] FIELD-ION SOURCES USING EUTECTIC ALLOYS
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NAMBA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (07) : L379 - L382
[5] B, AS AND SI FIELD-ION SOURCES
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UKEGAWA, T
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KA, KK
NAMBA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (10) : L595 - L598
[6] GAMO K, 1980, SEP P INT C MICR ENG, P283
[7] THE POST-IONIZATION OF FIELD EVAPORATED IONS - A THEORETICAL EXPLANATION OF MULTIPLE CHARGE STATES
KINGHAM, DR
[J]. SURFACE SCIENCE, 1982, 116 (02) : 273 - 301
[8] KNAUER W, 1981, OPTIK, V59, P335
[9] FET FABRICATION USING MASKLESS ION-IMPLANTATION
KUBENA, RL
ANDERSON, CL
SELIGER, RL
JULLENS, RA
STEVENS, EH
LAGNADO, I
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 916 - 920
[10] LOEFFLER KH, 1969, Z ANGEW PHYSIK, V27, P145