HIGH-CAPACITY SPUTTERING APPARATUS FOR HYBRID MICROWAVE INTEGRATED-CIRCUITS PRODUCTION

被引:2
作者
FERRARIS, GP [1 ]
机构
[1] GEIPIPARI TUDONAYOS EGYESULET,ADV TECHNOL DIV CASSINA DE PECCHI,MILAN,ITALY
关键词
D O I
10.1016/0040-6090(74)90256-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:113 / 124
页数:12
相关论文
共 11 条
[1]  
ASPESI L, 1968, 15 C SCIENT EL ROM, P165
[2]  
BERRY RW, 1968, THIN FILM TECHNOLOGY, pCH4
[3]  
FERRARIS GP, 1970, 71 REND RI ANN AEI
[4]  
FISCHER JS, 1971, P IEEE, V59, P1419
[5]  
GAYDOU FP, 1966, VAKUUM TECHN, V15, P161
[6]   USE OF SPUTTERED CONDUCTOR MATERIALS IN FILM INTEGRATED-CIRCUITS [J].
LAU, SS .
THIN SOLID FILMS, 1972, 14 (01) :87-103
[7]  
MAISSEL LI, 1970, HDB THIN FILM TECHNO, pCH18
[8]  
SCHILLING W, 1968, MICROWAVE DEC, P52
[9]   TEMPERATURE COEFFICIENT OF RESISTANCE OF BETATANTALUM FILMS AND MIXTURES WITH BCC-TANTALUM [J].
SCHWARTZ, N ;
REED, WA ;
POLASH, P ;
READ, MH .
THIN SOLID FILMS, 1972, 14 (02) :333-347
[10]  
SIGOURNAY N, 1967, 2 S DEP THIN FILMS S, P64