ELECTRON-IRRADIATION EFFECT IN AUGER ANALYSIS OF SIO2

被引：200

作者：

THOMAS, S ^{[1
]}

机构：

[1] MOTOROLA INC,SEMICOND PROD DIV,ELECTR OPTICS LAB,PHOENIX,AZ 85008

来源：

JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 01期

关键词：

D O I：

10.1063/1.1662951

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：161 / 166

页数：6

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共 21 条

[1] AUGER SPECTROSCOPY OF SILICON
BISHOP, HE
RIVIERE, JC
TAYLOR, NJ
[J]. SURFACE SCIENCE, 1969, 17 (02) : 462 - &
[2] LOCAL COMPOSITIONAL CHANGES IN ALKALI SILICATE GLASSES DURING ELECTRON MICROPROBE ANALYSIS
BOROM, MP
HANNEMAN, RE
[J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (05) : 2406 - &
[3] AUGER ELECTRON SPECTROSCOPY
CHANG, CC
[J]. SURFACE SCIENCE, 1971, 25 (01) : 53 - +
[4] CHARACTERISTIC ENERGIES IN SECONDARY ELECTRON SPECTRA FROM SI(111) SURFACES
CHUNG, MF
JENKINS, LH
[J]. SURFACE SCIENCE, 1971, 26 (02) : 649 - &
[5] AUGER ELECTRON SPECTROSCOPY OF SI
GRANT, JT
HAAS, TW
[J]. SURFACE SCIENCE, 1970, 23 (02) : 347 - &
[6] CHEMICAL EFFECTS IN AUGER-ELECTRON SPECTROSCOPY
HAAS, TW
GRANT, JT
DOOLEY, GJ
[J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (04) : 1853 - &
[7] (100) SURFACES OF ALKALI HALIDES .3. ELECTRON STIMULATED DESORPTION AND OVERALL DISCUSSION
HIGGINBOTHAM, IG
GALLON, TE
PRUTTON, M
TOKUTAKA, H
[J]. SURFACE SCIENCE, 1970, 21 (02) : 241 - +
[8] OXYGEN OUTGASSING CAUSED BY ELECTRON BOMBARDMENT OF GLASS
LINEWEAVER, JL
[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (06) : 1786 - &
[9] ELECTRON-STIMULATED DESORPTION AS A TOOL FOR STUDIES OF CHEMISORPTION - REVIEW
MADEY, TE
YATES, JT
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (04): : 525 - &
[10] INFLUENCE OF BAND STRUCTURE ON AUGER ELECTRON SPECTRUM OF SILICON
MAGUIRE, HG
AGUSTUS, PD
[J]. JOURNAL OF PHYSICS PART C SOLID STATE PHYSICS, 1971, 4 (09): : L174 - &