POINT-DEFECTS IN NEUTRON-TRANSMUTATION-DOPED CZOCHRALSKI-GROWN SI STUDIED BY POSITRON-ANNIHILATION

被引:15
作者
MENG, XT [1 ]
LIOLIOS, AK [1 ]
CHARDALAS, M [1 ]
DEDOUSSIS, S [1 ]
ELEFTHERIADIS, CA [1 ]
CHARALAMBOUS, S [1 ]
机构
[1] ARISTOTELIAN UNIV SALONIKA,DEPT PHYS,GR-54006 SALONIKA,GREECE
关键词
D O I
10.1016/0375-9601(91)90411-Z
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Positron lifetime and Doppler broadening of the annihilation line measurements in neutron-transmutation-doped Czochralski-grown silicon have been performed. Three annealing stages are observed due to the different annealing behaviour of V2, V4 and V-P complexes.
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页码:73 / 77
页数:5
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