ANALYSIS OF UV-LASER INDUCED OXIDATION OF IMPLANTED SILICON BY OPTICAL REFLECTIVITY MEASUREMENTS

被引：4

作者：

FOULON, F

SLAOUI, A

FOGARASSY, E

FUCHS, C

SIFFERT, P

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 47卷 / 03期

关键词：

D O I：

10.1007/BF00615931

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：255 / 258

页数：4

共 11 条

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