FILM DEPOSITION BY LASER-ARCS

被引：11

作者：

POMPE, W

SCHEIBE, HJ

SIEMROTH, P

WILBERG, R

SCHULZE, D

BUCKEN, B

机构：

[1] AKAD WISSENSCH DDR,ZENT INST ELEKTR PHYS,O-1086 BERLIN,GERMANY

[2] VEB HOCHVAKUUM,O-8017 DRESDEN,GERMANY

来源：

THIN SOLID FILMS | 1992年 / 208卷 / 01期

关键词：

D O I：

10.1016/0040-6090(92)90939-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This method of laser-induced vacuum arc evaporation includes advantages of the laser pulse vapour deposition (LPVD) technique and technologically utilized vacuum arc evaporation. It combines pulse deposition of LPVD with the high energy efficiency of a vacuum arc. An Nd:YAG laser beam is focused on a target having cathodic potential. This laser beam induces a plasma which initiates a vacuum arc discharge. First results for carbon and titanium film deposition are presented.

引用

页码：11 / 14

页数：4

共 11 条

[1] GROWTH OF POLYCRYSTALLINE CD3AS2 FILMS ON ROOM-TEMPERATURE SUBSTRATES BY A PULSED-LASER EVAPORATION TECHNIQUE [J].