FABRICATION OF LOW THRESHOLD VOLTAGE MICROLASERS

被引:22
作者
SCHERER, A [1 ]
JEWELL, JL [1 ]
WALTHER, M [1 ]
HARBISON, JP [1 ]
FLOREZ, LT [1 ]
机构
[1] PHOTON RES INC,BROOMFIELD,CO 80021
关键词
LASERS; SEMICONDUCTOR LASERS;
D O I
10.1049/el:19920773
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Vertical cavity surface emitting lasers (VCSELs) with threshold voltages of 1.7 V have been fabricated. The resistance-area product in these new vertical cavity lasers is comparable to that of edge-emitting lasers, and threshold currents as low as 3 mA have been measured. Molecular beam epitaxy was used to grow n-type mirrors, a quantum well active region, and a heavily Be-doped p-contact. After contact definition and alloying, passive high-reflectivity mirrors were deposited by reactive sputter deposition of SiO2/Si3N4 to complete the laser cavity.
引用
收藏
页码:1224 / 1226
页数:3
相关论文
共 4 条
  • [1] LOW-THRESHOLD ELECTRICALLY PUMPED VERTICAL-CAVITY SURFACE-EMITTING MICROLASERS
    JEWELL, JL
    SCHERER, A
    MCCALL, SL
    LEE, YH
    WALKER, S
    HARBISON, JP
    FLOREZ, LT
    [J]. ELECTRONICS LETTERS, 1989, 25 (17) : 1123 - 1124
  • [2] VERTICAL-CAVITY SURFACE-EMITTING LASERS - DESIGN, GROWTH, FABRICATION, CHARACTERIZATION
    JEWELL, JL
    HARBISON, JP
    SCHERER, A
    LEE, YH
    FLOREZ, LT
    [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1991, 27 (06) : 1332 - 1346
  • [3] SCHERER A, 1992, IN PRESS REACTIVE SP
  • [4] LOW-THRESHOLD VERTICAL CAVITY SURFACE-EMITTING LASERS WITH METALLIC REFLECTORS
    SCHUBERT, EF
    TU, LW
    KOPF, RF
    ZYDZIK, GJ
    DEPPE, DG
    [J]. APPLIED PHYSICS LETTERS, 1990, 57 (02) : 117 - 119