INP MIS TRANSISTORS WITH GROWN-IN SULFUR DIELECTRIC

被引:29
作者
POST, G
DIMITRIOU, P
SCAVENNEC, A
DUHAMEL, N
MIRCEA, A
机构
关键词
D O I
10.1049/el:19830313
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:459 / 461
页数:3
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共 12 条
[1]   VAPOR GROWTH AND PIEZOELECTRIC EFFECT OF INDIUM THIOPHOSPHATE, INPS4 [J].
BUBENZER, A ;
NITSCHE, R ;
RAUFER, A .
JOURNAL OF CRYSTAL GROWTH, 1975, 29 (03) :237-240
[2]   PLANAR SELF-ALIGNED ION-IMPLANTED INP MOSFET [J].
CAMERON, DC ;
IRVING, LD ;
WHITEHOUSE, CR ;
WOODWARD, J .
ELECTRONICS LETTERS, 1982, 18 (12) :534-536
[3]  
COT L, 1981, 11TH EUR SOL STAT DE
[4]   N-CHANNEL MISFETS ON SEMI-INSULATING INP FOR LOGIC APPLICATIONS [J].
HENRY, L ;
LECROSNIER, D ;
LHARIDON, H ;
PAUGAM, J ;
PELOUS, G ;
RICHOU, F ;
SALVI, M .
ELECTRONICS LETTERS, 1982, 18 (02) :102-103
[5]   ENHANCEMENT TYPE INP METAL-INSULATOR-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR WITH PLASMA ANODIC ALUMINUM-OXIDE AS THE GATE INSULATOR [J].
HIRAYAMA, Y ;
PARK, HM ;
KOSHIGA, F ;
SUGANO, T .
APPLIED PHYSICS LETTERS, 1982, 40 (08) :712-713
[6]  
ITOH T, 1982, P INT ELECTRON DEVIC, P7
[7]  
KAWAKAMI T, 1980, P INT ELECTRON DEVIC, P445
[8]   THE EFFECT OF INTERFACIAL TRAPS ON THE STABILITY OF INSULATED GATE DEVICES ON INP [J].
LILE, DL ;
TAYLOR, MJ .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (01) :260-267
[9]   INP HIGH MOBILITY ENHANCEMENT MISFETS USING ANODICALLY GROWN DOUBLE-LAYER GATE INSULATOR [J].
SAWADA, T ;
HASEGAWA, H .
ELECTRONICS LETTERS, 1982, 18 (17) :742-743
[10]   SUBSTRATE EFFECTS ON PERFORMANCE OF INP MOSFETS [J].
WOODWARD, J ;
BROWN, GT ;
COCKAYNE, B ;
CAMERON, DC .
ELECTRONICS LETTERS, 1982, 18 (10) :415-417