STACKING-FAULT STRUCTURES IN CARBON-CONTAMINATED LOW-TEMPERATURE EPITAXIAL SILICON

被引:10
作者
OGDEN, R
BRADLEY, RR
WATTS, BE
机构
[1] PLESSEY CO LTD,ALLEN CLARK RES CTR,CASWELL,NORTHAMPTONSHIR,ENGLAND
[2] PLESSEY CO LTD,ALLEN CLARK RES CTR,TOWCESTER,NORTHAMPTONSHIR,ENGLAND
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1974年 / 26卷 / 01期
关键词
D O I
10.1002/pssa.2210260112
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:135 / 146
页数:12
相关论文
共 27 条
[1]   SURFACE PROCESSES IN GROWTH SILICON ON (111)SILICON IN ULTRAHIGH VACUUM [J].
ABBINK, HC ;
BROUDY, RM ;
MCCARTHY, GP .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (10) :4673-&
[2]  
AMELINCKX S, 1964, SOLID STATE PHYS S, V6, P279
[3]   USEFUL PROPERTIES OF DARK-FIELD ELECTRON IMAGES [J].
BELL, WL ;
THOMAS, G .
PHYSICA STATUS SOLIDI, 1965, 12 (02) :843-&
[4]   ORIGIN OF STACKING FAULT IN EPITAXIALLY GROWN SILICON [J].
BOOKER, GR ;
STICKLER, R .
APPLIED PHYSICS LETTERS, 1963, 3 (09) :158-160
[5]   CRYSTALLOGRAPHIC IMPERFECTIONS IN SILICON [J].
BOOKER, GR .
DISCUSSIONS OF THE FARADAY SOCIETY, 1964, (38) :298-&
[6]   CRYSTALLOGRAPHIC IMPERFECTIONS IN EPITAXIALLY GROWN SILICON [J].
BOOKER, GR ;
STICKLER, R .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (11) :3281-&
[7]  
Brown A. S., 1970, Journal of Applied Crystallography, V3, P172, DOI 10.1107/S0021889870005873
[8]  
Bullough R., 1963, PROGR SEMICONDUCTORS, V7, P100
[9]   THE GROWTH OF CRYSTALS AND THE EQUILIBRIUM STRUCTURE OF THEIR SURFACES [J].
BURTON, WK ;
CABRERA, N ;
FRANK, FC .
PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1951, 243 (866) :299-358
[10]  
Cabrera N., 1958, GROWTH PERFECTION CR, P393