ELECTRICAL AND STRUCTURAL-PROPERTIES OF PULSE LASER-ANNEALED POLYCRYSTALLINE SILICON FILMS

被引：6

作者：

COX, TI

DESHMUKH, VGI

HILL, JR

WEBBER, HC

CHEW, NG

CULLIS, AG

机构：

来源：

关键词：

D O I：

10.1109/T-ED.1983.21203

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：737 / 744

页数：8

共 15 条

[1] EPITAXIAL LASER CRYSTALLIZATION OF THIN-FILM AMORPHOUS SILICON
BEAN, JC
LEAMY, HJ
POATE, JM
ROZGONYI, GA
SHENG, TT
WILLIAMS, JS
CELLER, GK
[J]. APPLIED PHYSICS LETTERS, 1978, 33 (03) : 227 - 230
[2] CRAWFORD RH, 1967, TEXAS INSTRUMENTS EL
[3] DEVICE FOR LASER-BEAM DIFFUSION AND HOMOGENIZATION
CULLIS, AG
WEBBER, HC
BAILEY, P
[J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1979, 12 (08): : 688 - 689
[4] MEASUREMENT OF THE VELOCITY OF THE CRYSTAL-LIQUID INTERFACE IN PULSED LASER ANNEALING OF SI
GALVIN, GJ
THOMPSON, MO
MAYER, JW
HAMMOND, RB
PAULTER, N
PEERCY, PS
[J]. PHYSICAL REVIEW LETTERS, 1982, 48 (01) : 33 - 36
[5] A COMPUTER-MODEL FOR PULSED LASER-HEATING OF DEVICE STRUCTURES
GODFREY, DJ
HILL, AC
HILL, C
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (08) : 1798 - 1803
[6] Hill C., 1982, Laser and Electron Beam Interactions with Solids. Proceedings of the Materials Research Society Annual Meeting, P579
[7] HILL C, 1982, LASER ELECTRON BEAM, P361
[8] RESISTIVITY OF BULK SILICON AND OF DIFFUSED LAYERS IN SILICON
IRVIN, JC
[J]. BELL SYSTEM TECHNICAL JOURNAL, 1962, 41 (02): : 387 - +
[9] JOUBERT P, 1975, VIDE, V180, P210
[10] Kodera H., 1963, JAP J APPL PHYS, V2, P212, DOI [10.1143/JJAP.2.212, DOI 10.1143/JJAP.2.212]