ELECTRON-IMPACT IONIZATION CROSS-SECTIONS OF THE SIF3 FREE-RADICAL

被引：48

作者：

HAYES, TR

SHUL, RJ

BAIOCCHI, FA

WETZEL, RC

FREUND, RS

机构：

来源：

JOURNAL OF CHEMICAL PHYSICS | 1988年 / 89卷 / 07期

关键词：

D O I：

10.1063/1.454836

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：4035 / 4041

页数：7

共 24 条

[11]

MOC J, 1986, J MOL STRUCT, V138, P3353

[12] PHOTOIONIZATION MASS-SPECTROMETRY OF FLUOROMETHYLSILANES (CH3)NF4-NSI(N=1-4) [J].

MURPHY, MK ;

BEAUCHAMP, JL .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1977, 99 (07) :2085-2089

[13] ION-ASSISTED ETCHING OF SILICON BY SF6 [J].

OOSTRA, DJ ;

HARING, A ;

DEVRIES, AE ;

SANDERS, FHM ;

MIYAKE, K .

APPLIED PHYSICS LETTERS, 1985, 46 (12) :1166-1168

[14] HEATS OF FORMATION OF FLUORINE-SUBSTITUTED SILYLENES, SILYL RADICALS, AND SILANES [J].

SCHLEGEL, HB .

JOURNAL OF PHYSICAL CHEMISTRY, 1984, 88 (25) :6254-6258

[15] LOW-LYING ELECTRONIC STATES OF SIF3 RADICAL [J].

SO, SP .

JOURNAL OF MOLECULAR STRUCTURE, 1977, 39 (01) :133-137

[16]

TOSSELL JA, 1973, INT J QUANTUM CHEM, V29, P346

[17] THE ELECTRONIC ORBITALS, SHAPES, AND SPECTRA OF POLYATOMIC MOLECULES .5. TETRATOMIC, NON-HYDRIDE MOLECULES, AB3 [J].

WALSH, AD .

JOURNAL OF THE CHEMICAL SOCIETY, 1953, (AUG) :2301-2306

[18] THERMOCHEMISTRY OF SILICON-CONTAINING COMPOUNDS .1. SILICON HALOGEN COMPOUNDS, AN EVALUATION [J].

WALSH, R .

JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS I, 1983, 79 :2233-2248

[19] EMISSION-SPECTRUM OF SIF3 [J].

WANG, JLF ;

KRISHNAN, CN ;

MARGRAVE, JL .

JOURNAL OF MOLECULAR SPECTROSCOPY, 1973, 48 (02) :346-353

[20] ENERGETICS AND DYNAMICS IN THE REACTION OF SI+ WITH SIF4 - THERMOCHEMISTRY OF SIFX AND SIF+X (X=1,2,3) [J].

WEBER, ME ;

ARMENTROUT, PB .

JOURNAL OF CHEMICAL PHYSICS, 1988, 88 (11) :6898-6910

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