EVALUATION OF METAL AND SEMICONDUCTOR-FILMS FORMED BY IONIZED-CLUSTER BEAM DEPOSITION

被引：56

作者：

TAKAGI, T ^{[1
]}

YAMADA, I ^{[1
]}

SASAKI, A ^{[1
]}

机构：

[1] KYOTO UNIV,DEPT ELECTR,KYOTO 606,JAPAN

来源：

关键词：

D O I：

10.1016/0040-6090(76)90638-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：207 / 217

页数：11

共 11 条

[1] BURROWS BJC, 68144 UK AT EN AUTH
[2] BURROWS BJC, 1968, 5 S FUS TECHN
[3] CHOPRA KL, 1969, THIN FILM PHENOMENA, P140
[4] NUCLEATION AND GROWTH OF RF TRIODE-SPUTTERED GOLD-FILMS
CORNELY, RH
MUMTAZ, A
FUSCHILLO, N
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (03): : 693 - 696
[5] ISHIDA I, 1976, THIN SOLID FILMS, V39, P227
[6] KAMIYAMA M, 1964, THIN FILM HDB
[7] SAMPLE SB, 1971, 11TH P S EL ION LAS, P359
[8] IONIZED-CLUSTER BEAM DEPOSITION
TAKAGI, T
YAMADA, I
SASAKI, A
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1128 - 1134
[9] TAKAGI T, 1974, JPN J APPL PHYS, P427
[10] TAKAGI T, 1974, 2ND P S ION SOURC FO