共 3 条
AN APPARATUS FOR STUDYING SPUTTER DEPOSITION WITH X-RAYS
被引:19
作者:
PAYNE, AP
[1
]
CLEMENS, BM
[1
]
BRENNAN, S
[1
]
机构:
[1] STANFORD SYNCHROTRON RADIAT LAB,STANFORD,CA 94309
关键词:
D O I:
10.1063/1.1143117
中图分类号:
TH7 [仪器、仪表];
学科分类号:
0804 ;
080401 ;
081102 ;
摘要:
While electron-based structural probes have been extensively applied to low-pressure film growth techniques such as evaporation, similar studies on sputter deposition have been hindered by the relatively high gas pressure (1-10 mT) inherent to the technique. Because x rays scatter more weakly than electrons the absorption in the ambient is not significant and diffraction from the growing film can be observed if a sufficiently bright source of x rays is used. We have developed a chamber which combines features of an ultrahigh-vacuum sputter-deposition system with the goniometric adjustments and the x-ray windows of a scattering chamber. A description of its design and recent results are presented.
引用
收藏
页码:1147 / 1149
页数:3
相关论文