LOW-LOSS ACHIEVED IN SOL-GEL BASED SILICA-ON-SILICON INTEGRATED-OPTICS USING BOROPHOSPHOSILICATE GLASS

被引：21

作者：

SYMS, RRA

SCHNEIDER, V

HUANG, W

HOLMES, AS

机构：

[1] OpticaI and Semiconductor Devices Section, Department of Electrical and Electronic Engineering, Imperial College of Science, Technology and Medicine, London SW7 2BT, Exhibition Road

来源：

ELECTRONICS LETTERS | 1995年 / 31卷 / 21期

关键词：

SOL-GEL PROCESSING; SILICON DIOXIDE; INTEGRATED OPTICS; OPTICAL WAVE-GUIDES;

D O I：

10.1049/el:19951230

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Polarisation-independent propagation losses of 0.2dB/cm are reported for near-infrared silica-on-silicon channel guides formed using sol-gel borophosphosilicate glass deposited by repetitive spin coating and rapid thermal annealing. The low loss is ascribed to a reduction in process temperature, which has allowed a total glass thickness of 30 mu m. The use of two dopants allows the glass viscosity to be adjusted independently of its refractive index, simplifying reflow and burial.

引用

页码：1833 / 1834

页数：2

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