EROSION PROFILE OF A RADIOFREQUENCY PLANAR MAGNETRON SPUTTERING TARGET WITH APERTURE SHIELD

被引:2
作者
HOLDEMAN, LB
MORELL, N
机构
[1] COMSAT Lab, Clarksburg, MD, USA, COMSAT Lab, Clarksburg, MD, USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 01期
关键词
D O I
10.1116/1.573485
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
7
引用
收藏
页码:137 / 138
页数:2
相关论文
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CHAPIN JS, 1974, RES DEV, V25, P37
[2]   HIGH-RATE SPUTTERING TECHNIQUES [J].
THORNTON, JA .
THIN SOLID FILMS, 1981, 80 (1-3) :1-11
[3]  
VONENGLE A, 1965, IONIZED GASES, P237
[4]  
VOSSEN JH, 1978, THIN FILM PROCESSES, P28
[5]  
Waits R.K., 1978, THIN FILM PROCESSES, p[24, 131]
[6]   PLANAR MAGNETRON SPUTTERING [J].
WAITS, RK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :179-187