SUBMICROMETER LITHOGRAPHIC PATTERNING OF THIN GOLD-FILMS WITH A SCANNING TUNNELING MICROSCOPE

被引：56

作者：

STOCKMAN, L

NEUTTIENS, G

VANHAESENDONCK, C

BRUYNSERAEDE, Y

机构：

[1] Laboratorium voor Vaste Stof-Fysika en Magnetisme, Katholieke Universiteit Leuven, B-3001 Leuven

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 23期

关键词：

D O I：

10.1063/1.109202

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A scanning tunneling microscope (STM) has been used to locally expose Langmuir-Blodgett layers of a negative electron beam resist (omega-tricosenoic acid) on top of a thin gold film. The STM operates in a dry nitrogen atmosphere at a voltage difference of about -10 V between the electrochemically etched Pt-Ir tip and the gold surface. After development in ethanol, the unexposed areas of the gold film are removed by argon ion milling. Gold wires with a linewidth down to 15 nm have been prepared. Electrical transport measurements confirm the homogeneity and the one-dimensional metallic character at low temperatures of the gold structures.

引用

页码：2935 / 2937

页数：3

共 15 条

[1] IMAGING AND MODIFICATION OF POLYMERS BY SCANNING TUNNELING AND ATOMIC FORCE MICROSCOPY [J].

ALBRECHT, TR ;

DOVEK, MM ;

LANG, CA ;

GRUTTER, P ;

QUATE, CF ;

KUAN, SWJ ;

FRANK, CW ;

PEASE, RFW .

JOURNAL OF APPLIED PHYSICS, 1988, 64 (03) :1178-1184

[2]

BARRAUD A, 1979, SOLID STATE TECHNOL, V22, P120

[3] POLYMERIZED MONO-MOLECULAR LAYERS - A NEW CLASS OF ULTRATHIN RESINS FOR MICROLITHOGRAPHY [J].

BARRAUD, A ;

ROSILIO, C ;

RUAUDELTEIXIER, A .

THIN SOLID FILMS, 1980, 68 (01) :91-98

[4] STRUCTURE AND REACTIVITY IN MONOMOLECULAR LANGMUIR-BLODGETT FILMS [J].

BARRAUD, A .

JOURNAL DE CHIMIE PHYSIQUE ET DE PHYSICO-CHIMIE BIOLOGIQUE, 1985, 82 (06) :683-689

[5] SOLID-STATE ELECTRON-INDUCED POLYMERIZATION OF OMEGA-TRICOSENOIC ACID MULTILAYERS [J].

BARRAUD, A ;

ROSILIO, C ;

RUAUDELTEIXIER, A .

JOURNAL OF COLLOID AND INTERFACE SCIENCE, 1977, 62 (03) :509-523

[6] WEAK LOCALIZATION AND CONDUCTANCE FLUCTUATIONS IN COMPLEX MESOSCOPIC GEOMETRIES [J].

CHANDRASEKHAR, V ;

SANTHANAM, P ;

PROBER, DE .

PHYSICAL REVIEW B, 1991, 44 (20) :11203-11220

[7] SCANNING TUNNELING MICROSCOPE LITHOGRAPHY - A SOLUTION TO ELECTRON-SCATTERING [J].

DOBISZ, EA ;

MARRIAN, CRK .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :3024-3027

[8] SUB-30-NM LITHOGRAPHY IN A NEGATIVE ELECTRON-BEAM RESIST WITH A VACUUM SCANNING TUNNELING MICROSCOPE [J].

DOBISZ, EA ;

MARRIAN, CRK .

APPLIED PHYSICS LETTERS, 1991, 58 (22) :2526-2528

[9] 4-PROBE RESISTANCE MEASUREMENTS OF NICKEL WIRES WRITTEN WITH A SCANNING TUNNELING MICROSCOPE SCANNING ELECTRON-MICROSCOPE SYSTEM [J].

EHRICHS, EE ;

SMITH, WF ;

DELOZANNE, AL .

ULTRAMICROSCOPY, 1992, 42 :1438-1442

[10] LITHOGRAPHIC STUDIES OF AN E-BEAM RESIST IN A VACUUM SCANNING TUNNELING MICROSCOPE [J].

MARRIAN, CRK ;

DOBISZ, EA ;

COLTON, RJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (04) :3563-3569

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