HALL-EFFECT DEPLETION CORRECTIONS IN ION-IMPLANTED SAMPLES - SI-29 IN GAAS

被引:6
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LOOK, DC
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10.1063/1.344250
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O59 [应用物理学];
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页码:2420 / 2424
页数:5
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共 9 条
[1]   SEMICONDUCTING AND OTHER MAJOR PROPERTIES OF GALLIUM-ARSENIDE [J].
BLAKEMORE, JS .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (10) :R123-R181
[2]   SURFACE AND INTERFACE DEPLETION CORRECTIONS TO FREE CARRIER-DENSITY DETERMINATIONS BY HALL MEASUREMENTS [J].
CHANDRA, A ;
WOOD, CEC ;
WOODARD, DW ;
EASTMAN, LF .
SOLID-STATE ELECTRONICS, 1979, 22 (07) :645-650
[3]  
DUNCAN WM, 1987, I PHYS C SER, V83, P39
[5]  
Look D. C., 1989, ELECT CHARACTERIZATI, P117
[6]  
LOOK DC, 1983, SEMICONDUCT SEMIMET, V19, P93
[7]  
LOOK DC, 1989, ELECTRICAL CHARACTER, P93
[8]   ELECTRICAL ACTIVATION OF IMPLANTED BE, MG, ZN, AND CD IN GAAS BY RAPID THERMAL ANNEALING [J].
PEARTON, SJ ;
CUMMINGS, KD ;
VELLACOLEIRO, GP .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (08) :3252-3254
[9]   UNIFIED DEFECT MODEL AND BEYOND [J].
SPICER, WE ;
LINDAU, I ;
SKEATH, P ;
SU, CY .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (05) :1019-1027