INFLUENCE OF CHANNELING ON CU SINGLE-CRYSTAL SPUTTERING - (AR+ IONS - 2-20 KEV - T/E)

被引：88

作者：

ONDERDELINDEN, D

机构：

来源：

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D O I：

10.1063/1.1754548

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：189 / +

页数：1

共 10 条

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ROL, PK
KISTEMAK, J
[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (03) : 690 - &
[2] LINDHARD J, 1965, MAT FYS MEDD DAN VID, V34, P14
[3] SPUTTERING YIELDS OF SINGLE CRYSTALS BOMBARDED BY 1- TO 10-KEV AR+ IONS
MAGNUSON, GD
CARLSTON, CE
[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (11) : 3267 - &
[4] MARTYNEN.YV, 1965, FIZ TVERD TELA+, V6, P1581
[5] NILSSON NR, 1959, 4 P INT C ION PHE ED, P257
[6] ODINTSOV DD, 1963, SOV PHYS-SOL STATE, V5, P813
[7] ONDERDELINEN D, 1966, 7 P INT C ION PHEN G
[8] ROL PK, 1959, 4 P INT C ION PHEN G, P257
[9] SPUTTERING EXPERIMENTS WITH 1- TO 5-KEV AR+ IONS
SOUTHERN, AL
ROBINSON, MT
WILLIS, WR
[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (01) : 153 - &
[10] HIGH-ENERGY SPUTTERING
YONTS, OC
NORMAND, CE
HARRISON, DE
[J]. JOURNAL OF APPLIED PHYSICS, 1960, 31 (03) : 447 - 450