JOSEPHSON TUNNELING THROUGH LOCALLY THINNED SILICON WAFERS

被引：38

作者：

HUANG, CL

VANDUZER, T

机构：

[1] UNIV CALIF,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720

[2] UNIV CALIF,ELECTR RES LAB,BERKELEY,CA 94720

来源：

APPLIED PHYSICS LETTERS | 1974年 / 25卷 / 12期

关键词：

D O I：

10.1063/1.1655388

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：753 / 756

页数：4

相关论文

共 12 条

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