MASKLESS PATTERNING OF INDIUM TIN OXIDE LAYER FOR FLAT-PANEL DISPLAYS BY DIODE-PUMPED NDYLF LASER IRRADIATION

被引:59
作者
TAKAI, M
BOLLMANN, D
HABERGER, K
机构
[1] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN
[2] FRAUNHOFER INST SOLID STATE TECHNOL,D-80686 MUNICH,GERMANY
关键词
D O I
10.1063/1.111980
中图分类号
O59 [应用物理学];
学科分类号
摘要
An indium tin oxide (ITO) layer on a lime glass substrate for flat panel displays has been patterned without a mask by scanning Nd:YLF (neodymium-doped yttrium-lithium-fluoride) laser irradiation in a pulsed mode. Both fundamental and frequency doubled lines of 1.047 mum and 523.5 nm were compared for processing. SEM (scanning electron microscopy) and surface stylus observation revealed that only the top ITO layer could be removed without substrate etching. A finer patterning was possible for irradiation of a 523.5 nm line because of the better focusing feature, though higher laser energy density was required for this line than for a 1.047 mum line because of the lower light absorption.
引用
收藏
页码:2560 / 2562
页数:3
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