ELASTIC STRAIN AND MISFIT DISLOCATION DENSITY IN SI0.92GE0.08 FILMS ON SILICON SUBSTRATES

被引：140

作者：

KASPER, E ^{[1
]}

HERZOG, HJ ^{[1
]}

机构：

[1] FORSCH INST ULM,AEG TELEFUNKEN,ULM,FED REP GER

来源：

THIN SOLID FILMS | 1977年 / 44卷 / 03期

关键词：

D O I：

10.1016/0040-6090(77)90443-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：357 / 370

页数：14

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