RECENT ADVANCES IN SPUTTER-DEPOSITION

被引：60

作者：

WINDOW, B

机构：

[1] CSIRO Division of Applied Physics, Lindfield

来源：

SURFACE & COATINGS TECHNOLOGY | 1995年 / 71卷 / 02期

关键词：

MAGNETRON; SPUTTERING; BOMBARDMENT;

D O I：

10.1016/0257-8972(95)80024-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Recent progress in understanding the ion and atom bombarding properties of magnetron sputtering sources is described, and ways of controlling the bombardment using source design, source excitation or system design are outlined. Some recent technological developments in magnetron sputtering are discussed.

引用

页码：93 / 97

页数：5

共 28 条

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