A QUASI-DIRECT-CURRENT SPUTTERING TECHNIQUE FOR THE DEPOSITION OF DIELECTRICS AT ENHANCED RATES

被引：51

作者：

ESTE, G

WESTWOOD, WD

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575266

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1845 / 1848

页数：4

共 20 条

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