KINETICS OF THERMAL GROWTH OF SILICON DIOXIDE FILMS IN WATER VAPOR-OXYGEN-ARGON MIXTURES

被引:34
作者
NAKAYAMA, T
COLLINS, FC
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D O I
10.1149/1.2424096
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:706 / +
页数:1
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