共 21 条
[1]
IMPORTANCE OF ARGON PRESSURE IN THE PREPARATION OF RF-SPUTTERED AMORPHOUS SILICON-HYDROGEN ALLOYS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1979, 16 (03)
:906-912
[3]
Bondarenko A. V., 1973, Soviet Physics - Technical Physics, V18, P515
[4]
BOUCHIER D, 1977, THESIS U PARIS
[5]
SPATIAL-DISTRIBUTION OF IONS IMPLANTED INTO SOLIDS SUBJECT TO DIFFUSION AND SURFACE SPUTTERING
[J].
RADIATION EFFECTS AND DEFECTS IN SOLIDS,
1975, 26 (03)
:181-191
[6]
GUIVARCH A, 1974, SESSIONS ETUDES CANA, P263
[7]
HIROSE M, 1981, AIP C P, V20, P10
[8]
KAMAPS RJ, 1982, J APPL PHYS, V53, P6408
[10]
OPTICAL-EMISSION SPECTROSCOPY - TOWARD THE IDENTIFICATION OF SPECIES IN THE PLASMA DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON ALLOYS
[J].
SOLAR CELLS,
1980, 2 (04)
:385-400