AUGER-ELECTRON AND X-RAY PHOTOELECTRON-SPECTROSCOPY OF SPUTTER DEPOSITED ALUMINUM NITRIDE

被引：81

作者：

KOVACICH, JA

KASPERKIEWICZ, J

LICHTMAN, D

AITA, CR

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201

[2] UNIV WISCONSIN,DEPT MAT,MILWAUKEE,WI 53201

来源：

关键词：

D O I：

10.1063/1.333335

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2935 / 2939

页数：5

共 16 条

[1] RARE GAS-OXYGEN EFFECTS ON THE RF SPUTTER DEPOSITION OF PLATINUM
AITA, CR
TRAN, NC
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (10) : 6051 - 6052
[2] BASAL ORIENTATION ALUMINUM NITRIDE GROWN AT LOW-TEMPERATURE BY RF DIODE SPUTTERING
AITA, CR
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1807 - 1808
[3] THE DEPENDENCE OF ALUMINUM NITRIDE FILM CRYSTALLOGRAPHY ON SPUTTERING PLASMA COMPOSITION
AITA, CR
GAWLAK, CJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1983, 1 (02): : 403 - 406
[4] BARR TL, 1983, PRACTICAL SURFACE AN
[5] X-RAY PHOTOELECTRON SPECTROSCOPIC STUDY OF INTERACTION OF OXYGEN AND NITRIC-OXIDE WITH ALUMINUM
CARLEY, AF
ROBERTS, MW
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 1978, 363 (1714): : 403 - 424
[6] DAVIS LE, 1976, HDB AUGER ELECTRON S
[7] ELECTRON-BEAM EFFECTS ON OXYGEN EXPOSED ALUMINUM SURFACES
FONTAINE, JM
LEEDEACON, O
DURAUD, JP
ICHIMURA, S
LEGRESSUS, C
[J]. SURFACE SCIENCE, 1982, 122 (01) : 40 - 54
[8] FOSTER NF, 1970, HDB THIN FILM TECHNO, P12
[9] FORMATION OF AL-NITRIDE FILMS AT ROOM-TEMPERATURE BY NITROGEN ION-IMPLANTATION INTO ALUMINUM
LIESKE, N
HEZEL, R
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (09) : 5806 - 5810
[10] Pauling L, 1960, NATURE CHEM BOND, P244