THE DEPENDENCE OF ALUMINUM NITRIDE FILM CRYSTALLOGRAPHY ON SPUTTERING PLASMA COMPOSITION

被引：65

作者：

AITA, CR ^{[1
]}

GAWLAK, CJ ^{[1
]}

机构：

[1] UNIV WISCONSIN, DEPT MAT, MILWAUKEE, WI 53201 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.571930

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：403 / 406

页数：4

共 32 条

[1] DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS
ABE, T
YAMASHINA, T
[J]. THIN SOLID FILMS, 1975, 30 (01) : 19 - 27
[2] BASAL ORIENTATION ALUMINUM NITRIDE GROWN AT LOW-TEMPERATURE BY RF DIODE SPUTTERING
AITA, CR
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1807 - 1808
[3] THE EFFECT OF O-2 ON REACTIVELY SPUTTERED ZINC-OXIDE
AITA, CR
PURDES, AJ
LAD, RJ
FUNKENBUSCH, PD
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5533 - 5536
[4] GLOW-DISCHARGE MASS-SPECTROMETRY OF SPUTTERED TANTALUM NITRIDE
AITA, CR
MYERS, TA
LAROCCA, WJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 324 - 327
[5] ENHANCEMENT OF TA+ FLUX BY SUBSTRATE BIASING DURING SPUTTER DEPOSITION OF TANTALUM NITROGEN FILMS
AITA, CR
MYERS, TA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 348 - 351
[6] THE EFFECT OF RF POWER ON REACTIVELY SPUTTERED ZINC-OXIDE
AITA, CR
LAD, RJ
TISONE, TC
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (12) : 6405 - 6410
[7] PLASMA DIAGNOSTICS OF AN RF-SPUTTERING GLOW DISCHARGE
COBURN, JW
KAY, E
[J]. APPLIED PHYSICS LETTERS, 1971, 18 (10) : 435 - &
[8] GLOW-DISCHARGE MASS-SPECTROMETRY - TECHNIQUE FOR DETERMINING ELEMENTAL COMPOSITION PROFILES IN SOLIDS
COBURN, JW
TAGLAUER, E
KAY, E
[J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) : 1779 - 1786
[9] MASS-SPECTROMETRIC STUDY OF NEUTRAL-SPUTTERED SPECIES IN AN RF GLOW-DISCHARGE SPUTTERING SYSTEM
COBURN, JW
ECKSTEIN, EW
KAY, E
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 151 - 154
[10] DC CATHODE SPUTTERING - INFLUENCE OF OXYGEN-CONTENT IN GAS-FLOW ON DISCHARGE CURRENT
GORANCHEV, B
ORLINOV, V
POPOVA, V
[J]. THIN SOLID FILMS, 1976, 33 (02) : 173 - 183

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