ENHANCEMENT OF TA+ FLUX BY SUBSTRATE BIASING DURING SPUTTER DEPOSITION OF TANTALUM NITROGEN FILMS

被引：19

作者：

AITA, CR

MYERS, TA

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201

[2] GOULD LABS,ROLLING MEADOWS,IL 60008

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.572132

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：348 / 351

页数：4

共 25 条

[1] DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS
ABE, T
YAMASHINA, T
[J]. THIN SOLID FILMS, 1975, 30 (01) : 19 - 27
[2] GLOW-DISCHARGE MASS-SPECTROMETRY OF SPUTTERED TANTALUM NITRIDE
AITA, CR
MYERS, TA
LAROCCA, WJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 324 - 327
[3] THE EFFECT OF RF POWER ON REACTIVELY SPUTTERED ZINC-OXIDE
AITA, CR
LAD, RJ
TISONE, TC
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (12) : 6405 - 6410
[4] Azaroff, 1968, ELEMENTS XRAY CRYSTA, P549
[5] PLASMA DIAGNOSTICS OF AN RF-SPUTTERING GLOW DISCHARGE
COBURN, JW
KAY, E
[J]. APPLIED PHYSICS LETTERS, 1971, 18 (10) : 435 - &
[6] POSITIVE-ION BOMBARDMENT OF SUBSTRATES IN RF DIODE GLOW-DISCHARGE SPUTTERING
COBURN, JW
KAY, E
[J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (12) : 4965 - 4971
[7] GLOW-DISCHARGE MASS-SPECTROMETRY - TECHNIQUE FOR DETERMINING ELEMENTAL COMPOSITION PROFILES IN SOLIDS
COBURN, JW
TAGLAUER, E
KAY, E
[J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) : 1779 - 1786
[8] MASS-SPECTROMETRIC STUDY OF NEUTRAL-SPUTTERED SPECIES IN AN RF GLOW-DISCHARGE SPUTTERING SYSTEM
COBURN, JW
ECKSTEIN, EW
KAY, E
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 151 - 154
[9] PREPARATION STRUCTURE AND PROPERTIES OF SPUTTERED HIGHLY NITRIDED TANTALUM FILMS
COYNE, HJ
TAUBER, RN
[J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) : 5585 - +
[10] SUPERCONDUCTIVE FILMS MADE BY PROTECTED SPUTTERING OF TANTALUM OR NIOBIUM
FRERICHS, R
[J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (05) : 1898 - &

← 1 2 3 →