RARE GAS-OXYGEN EFFECTS ON THE RF SPUTTER DEPOSITION OF PLATINUM

被引：17

作者：

AITA, CR

TRAN, NC

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201

[2] UNIV WISCONSIN,CTR MAT SCI,MADISON,WI 53706

来源：

关键词：

D O I：

10.1063/1.331752

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：6051 / 6052

页数：2

共 8 条

[1] ARGON-OXYGEN INTERACTION IN RF-SPUTTERING GLOW-DISCHARGES
AITA, CR
MARHIC, ME
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) : 6584 - 6587
[2] OPTICAL-EMISSION FROM NEON OXYGEN RF SPUTTERING GLOW-DISCHARGES
AITA, CR
MARHIC, ME
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (01): : 69 - 73
[3] OXYGEN INDUCED PREFERRED ORIENTATION OF DC SPUTTERED PLATINUM
HECQ, M
HECQ, A
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 219 - 222
[4] SPUTTERING DEPOSITION, XPS AND X-RAY-DIFFRACTION CHARACTERIZATION OF OXYGEN-PLATINUM COMPOUNDS
HECQ, M
HECQ, A
DELRUE, JP
ROBERT, T
[J]. JOURNAL OF THE LESS-COMMON METALS, 1979, 64 (02): : P25 - P37
[5] SURFACE-DEFECTS AND THERMODYNAMICS OF CHEMISORBED LAYERS
LAGALLY, MG
LU, TM
WELKIE, DG
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01): : 223 - 230
[6] TAKEUCHI A, UNPUB
[7] INTERNAL-STRESSES IN AMORPHOUS-SILICON FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING USING NE, AR, KR, XE, AND AR+H2
THORNTON, JA
HOFFMAN, DW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 203 - 207
[8] WESTWOOD WD, 1974, J APPL PHYS, V45, P2313, DOI 10.1063/1.1663583