FI-STM STUDY OF ALKALI-METAL ADSORPTION ON SI SURFACES

被引:29
作者
HASHIZUME, T
HASEGAWA, Y
SUMITA, I
SAKURAI, T
机构
[1] UNIV TOKYO,INST SOLID STATE PHYS,TOKYO 106,JAPAN
[2] MATSUSHITA RES INST TOKYO,TAMA KU,KAWASAKI 222,JAPAN
关键词
D O I
10.1016/0039-6028(91)90413-M
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Alkali metal (Cs/K) adsorption on the Si(111)7 x 7 and Si(100)2 x 1 surfaces was investigated with the FI-STM. At the initial coverage on the Si(111)7 x 7 surface, Cs(K) atoms adsorb at the on-top site of the center adatoms and are almost completely ionized. When heated at 300-degrees-C, a new 1 x 3 phase with misfit defects is formed. On the Si(100)2 x 1 surface, Cs atoms occupy the off-centered valley bridge site at the initial coverage. These results, together with Li/K adsorption, can be well understood based on the strong interaction between the directional Si dangling bonds and active alkali metal atoms.
引用
收藏
页码:189 / 194
页数:6
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