STRUCTURE CHANGE OF MICROCRYSTALLINE SILICON FILMS IN DEPOSITION PROCESS

被引：39

作者：

IMURA, T

KAYA, H

TERAUCHI, H

KIYONO, H

HIRAKI, A

ICHIHARA, M

机构：

[1] OSAKA UNIV,FAC ENGN,SUITA,OSAKA 565,JAPAN

[2] UNIV TOKYO,INST SOLID STATE PHYS,TOKYO 106,JAPAN

[3] TOA NENRYO CO LTD,CENT RES LAB,SAITAMA 354,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1984年 / 23卷 / 02期

关键词：

D O I：

10.1143/JJAP.23.179

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：179 / 183

页数：5

共 13 条

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