A COMBINED ELECTRON AND ION-BEAM LITHOGRAPHY SYSTEM

被引：5

作者：

CLEAVER, JRA

AHMED, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.583198

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：144 / 147

页数：4

共 10 条

[1]

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[4]

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[5]

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FOX, TR ;

LAM, K .

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[7] BEAM-ENERGY DISTRIBUTION MEASUREMENTS OF LIQUID GALLIUM FIELD-ION SOURCES [J].

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[8]

PHILLIPS DH, 1983, P SPIE, V393

[9] LIQUID-METAL SOURCE OF GOLD IONS [J].

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REVIEW OF SCIENTIFIC INSTRUMENTS, 1981, 52 (04) :562-566

[10]

SMITH B, 1977, ION IMPLANTATION RAN

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