INVESTIGATION OF THE AL/TISI2/SI CONTACT SYSTEM

[1] CONTACT RESISTANCE AND CONTACT RESISTIVITY [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (04) : 507 - &

[2] BOWER RW, 1973, APPL PHYS LETT, V23, P99, DOI 10.1063/1.1654823

[3] THERMAL-STABILITY OF TITANIUM NITRIDE FOR SHALLOW JUNCTION SOLAR-CELL CONTACTS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (06) : 4297 - 4299

[4] Chu WK., 1978, BACKSCATTERING SPECT

[5] STUDY OF AL-PD2SI CONTACTS ON SI [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 75 - 78

[6] GROVE AS, 1967, PHYS TECHNOL S, P298

[7] HO PS, 1978, P S THIN FILM PHENOM, V78, P66

[8] ALUMINUM-NICKEL SILICIDE CONTACTS ON SILICON [J]. THIN SOLID FILMS, 1978, 53 (02) : 135 - 140

[9] ELECTRICAL AND MECHANICAL FEATURES OF PLATINUM SILICIDE-ALUMINUM REACTION [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (08) : 3476 - 3485

[10] PLATINUM SILICIDE-ALUMINUM SCHOTTKY DIODE CHARACTERISTICS [J]. APPLIED PHYSICS LETTERS, 1972, 21 (06) : 256 - &

[1] CONTACT RESISTANCE AND CONTACT RESISTIVITY [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (04) : 507 - &

[2] BOWER RW, 1973, APPL PHYS LETT, V23, P99, DOI 10.1063/1.1654823

[3] THERMAL-STABILITY OF TITANIUM NITRIDE FOR SHALLOW JUNCTION SOLAR-CELL CONTACTS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (06) : 4297 - 4299

[4] Chu WK., 1978, BACKSCATTERING SPECT

[5] STUDY OF AL-PD2SI CONTACTS ON SI [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 75 - 78

[6] GROVE AS, 1967, PHYS TECHNOL S, P298

[7] HO PS, 1978, P S THIN FILM PHENOM, V78, P66

[8] ALUMINUM-NICKEL SILICIDE CONTACTS ON SILICON [J]. THIN SOLID FILMS, 1978, 53 (02) : 135 - 140

[9] ELECTRICAL AND MECHANICAL FEATURES OF PLATINUM SILICIDE-ALUMINUM REACTION [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (08) : 3476 - 3485

[10] PLATINUM SILICIDE-ALUMINUM SCHOTTKY DIODE CHARACTERISTICS [J]. APPLIED PHYSICS LETTERS, 1972, 21 (06) : 256 - &