THEORY OF PLASMA CHEMICAL-TRANSPORT ETCHING OF GOLD IN A CHLORINE PLASMA

被引：7

作者：

ZAROWIN, CB ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

关键词：

D O I：

10.1016/0040-6090(81)90052-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：33 / 42

页数：10

共 9 条

[1]

BOSWORTH RLC, TRANSPORT PROCESSES, P124

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[4] ETCHING CHARACTERISTICS OF SILICATE GLASS-FILMS IN CF4 PLASMA [J].

JINNO, K ;

KINOSHITA, H ;

MATSUMOTO, Y .

[5] VAPOR TRANSPORT OF SOLIDS BY VAPOR PHASE REACTIONS [J].

MANDEL, G .

Mogab, C. J. ;

Shankoff, T. A. .

[7]

MOGAB CJ, 1977, J ELECTROCHEM SOC, V124, P1262, DOI 10.1149/1.2133542

[8]

ZAROWIN CB, 1979, 4TH P INT C PLASM CH, V1, P56

[9]

ZAROWIN CB, 1978, OCT P EL SOC M