LOW-TEMPERATURE DIFFUSION OF AU INTO SI IN SI(SUBSTRATE)-AU(FILM) SYSTEM

被引：38

作者：

NAKASHIMA, K

IWAMI, M

HIRAKI, A

机构：

[1] NAGOYA INST TECHNOL,DEPT ELECT ENGN,NAGOYA,JAPAN

[2] OSAKA UNIV,DEPT ELECT ENGN,DENKI BUSSEI LAB,SUITA,OSAKA,JAPAN

来源：

THIN SOLID FILMS | 1975年 / 25卷 / 02期

关键词：

D O I：

10.1016/0040-6090(75)90060-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：423 / 430

页数：8

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