THERMAL-OXIDATION OF HEAVILY PHOSPHORUS-DOPED THIN-FILMS OF POLYCRYSTALLINE SILICON

被引：28

作者：

SARASWAT, KC

SINGH, H

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 10期

关键词：

D O I：

10.1149/1.2123503

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2321 / 2326

页数：6

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