PHOTOELECTRON MEAN FREE-PATH CHEMICAL-COMPOSITION DEPENDENCE AND ELASTIC-SCATTERING AND ANALYZER ACCEPTANCE ANGLE FINITENESS EFFECTS IN RESTORING CONCENTRATION PROFILES FROM ANGULAR RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY DATA

A numerical technique for restoration of non-destructive depth-concentration profiles from angular resolved X-ray photoelectron spectroscopy (ARXPS) data taking into account photoelectron mean free path chemical composition dependence has been proposed. The numerical procedure developed earlier has been modified to a minor extent with the restoration problem retaining linearity. The capabilities of the technique have been demonstrated in terms of experimental ARXPS data for polyurethane film on golden substrate. The photoelectron elastic scattering and analyzer acceptance angle finiteness effects have been discussed as well.