FABRICATION AND IV CHARACTERISTICS OF HIGH-TC NB3GE MICROBRIDGES

被引：7

作者：

HIKITA, M

NAKAMURA, K

KUBO, S

IGARASHI, M

KAKUCHI, M

KOGURE, O

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1982年 / 21卷 / 01期

关键词：

D O I：

10.1143/JJAP.21.L10

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L10 / L12

页数：3

共 10 条

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