A NEW HIGH-RESOLUTION NEGATIVE ELECTRON RESIST CHLOROMETHYLATED POLY-ALPHA-METHYLSTYRENE (ALPHA-M-CMS)

被引：27

作者：

SUKEGAWA, K

SUGAWARA, S

机构：

来源：

关键词：

D O I：

10.1143/JJAP.20.L583

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L583 / L586

页数：4

共 11 条

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