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CHANNELING EFFECT MEASUREMENTS OF RECRYSTALLIZATION OF AMORPHOUS SI LAYERS ON CRYSTAL SI

被引：192
作者：
CSEPREGI, L
MAYER, JW
SIGMON, TW
机构：
[1] CALTECH,PASADENA,CA 91125
[2] HEWLETT PACKARD LABS,PALO ALTO,CA 94304
来源：
PHYSICS LETTERS A | 1975年 / 54卷 / 02期
关键词：
D O I：
10.1016/0375-9601(75)90847-6
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：157 / 158
页数：2
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