ION-BEAM PROCESSING USING METAL ON POLYMER MASKS

被引：10

作者：

HU, EL

HOWARD, RE

GRABBE, P

TENNANT, DM

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 05期

关键词：

D O I：

10.1149/1.2119911

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1171 / 1173

页数：3

共 7 条

[1]

GIBBONS JF, 1975, PROJECTED RANGE STAT

[2] TRILEVEL LIFT-OFF PROCESS FOR REFRACTORY-METALS [J].

GRABBE, P ;

HU, EL ;

HOWARD, RE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (01) :33-35

[3] SINGLE-STEP OPTICAL LIFT-OFF PROCESS [J].

HATZAKIS, M ;

CANAVELLO, BJ ;

SHAW, JM .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (04) :452-460

[4] 400-A LINEWIDTH E-BEAM LITHOGRAPHY ON THICK SILICON SUBSTRATES [J].

HOWARD, RE ;

HU, EL ;

JACKEL, LD ;

GRABBE, P ;

TENNANT, DM .

APPLIED PHYSICS LETTERS, 1980, 36 (07) :592-594

[5] REACTIVE-ION ETCHING OF GAAS AND INP USING CCL2F2-AR-O2 [J].

HU, EL ;

HOWARD, RE .

APPLIED PHYSICS LETTERS, 1980, 37 (11) :1022-1024

[6]

PROBER D, COMMUNICATION

[7]

POLYIMIDE XU218

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