EVIDENCE FOR A SELF-PROPAGATING MELT IN AMORPHOUS-SILICON UPON PULSED-LASER IRRADIATION

[1] PHASE-TRANSITIONS IN AMORPHOUS SI PRODUCED BY RAPID HEATING [J]. PHYSICAL REVIEW LETTERS, 1980, 45 (25) : 2036 - 2039

[2] SEGREGATION EFFECTS IN CU-IMPLANTED SI AFTER LASER-PULSE MELTING [J]. PHYSICAL REVIEW LETTERS, 1978, 41 (18) : 1246 - 1249

[3] BAERI P, 1982, LASER ANNEALING SEMI, P500

[4] BAGLEY BG, 1979, AIP C P, V50, P97

[5] Chu W.K., 1978, BACK SCATTERING SPEC

[6] PULSED-LASER MELTING OF AMORPHOUS-SILICON - TIME-RESOLVED MEASUREMENTS AND MODEL-CALCULATIONS [J]. PHYSICAL REVIEW LETTERS, 1984, 52 (07) : 561 - 564

[7] PULSED LASER MELTING OF AMORPHOUS-SILICON LAYERS [J]. APPLIED PHYSICS LETTERS, 1984, 44 (01) : 35 - 37

[8] OLSON GL, 1983, UNPUB P US JAPAN SEM

[9] Spaepen F., 1979, AIP CONF P, V50, P73, DOI [10.1063/1.31738, DOI 10.1063/1.31738]

[10] MELTING TEMPERATURE AND EXPLOSIVE CRYSTALLIZATION OF AMORPHOUS-SILICON DURING PULSED LASER IRRADIATION [J]. PHYSICAL REVIEW LETTERS, 1984, 52 (26) : 2360 - 2363

[1] PHASE-TRANSITIONS IN AMORPHOUS SI PRODUCED BY RAPID HEATING [J]. PHYSICAL REVIEW LETTERS, 1980, 45 (25) : 2036 - 2039

[2] SEGREGATION EFFECTS IN CU-IMPLANTED SI AFTER LASER-PULSE MELTING [J]. PHYSICAL REVIEW LETTERS, 1978, 41 (18) : 1246 - 1249

[3] BAERI P, 1982, LASER ANNEALING SEMI, P500

[4] BAGLEY BG, 1979, AIP C P, V50, P97

[5] Chu W.K., 1978, BACK SCATTERING SPEC

[6] PULSED-LASER MELTING OF AMORPHOUS-SILICON - TIME-RESOLVED MEASUREMENTS AND MODEL-CALCULATIONS [J]. PHYSICAL REVIEW LETTERS, 1984, 52 (07) : 561 - 564

[7] PULSED LASER MELTING OF AMORPHOUS-SILICON LAYERS [J]. APPLIED PHYSICS LETTERS, 1984, 44 (01) : 35 - 37

[8] OLSON GL, 1983, UNPUB P US JAPAN SEM

[9] Spaepen F., 1979, AIP CONF P, V50, P73, DOI [10.1063/1.31738, DOI 10.1063/1.31738]

[10] MELTING TEMPERATURE AND EXPLOSIVE CRYSTALLIZATION OF AMORPHOUS-SILICON DURING PULSED LASER IRRADIATION [J]. PHYSICAL REVIEW LETTERS, 1984, 52 (26) : 2360 - 2363