PHOTOEMISSION-STUDY OF THE GROWTH AND MODIFICATION OF THE AL/TA(110) INTERFACE

被引：2

作者：

DIMARZIO, D

RUCKMAN, MW

QIU, SL

JIANG, L

CHEN, J

STRONGIN, M

机构：

[1] BROOKHAVEN NATL LAB,DEPT APPL SCI,UPTON,NY 11973

[2] BROOKHAVEN NATL LAB,DEPT PHYS,UPTON,NY 11973

[3] BROOKHAVEN NATL LAB,NATL SYNCHROTRON LIGHT SOURCE,UPTON,NY 11973

来源：

PHYSICAL REVIEW B | 1989年 / 39卷 / 09期

关键词：

D O I：

10.1103/PhysRevB.39.5591

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：5591 / 5598

页数：8

共 23 条

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