ELECTRICAL-PROPERTIES OF THE BARRIER LAYER SOLUTION INTERFACE AND ITS ROLE DURING BREAKDOWN OF ANODIC BISMUTH OXIDE-FILMS

被引：11

作者：

KANAZIRSKI, I ^{[1
]}

BOJINOV, M ^{[1
]}

GIRGINOV, A ^{[1
]}

机构：

[1] BULGARIAN ACAD SCI,CENT LAB ELECTROCHEM POWER SOURCES,BU-1113 SOFIA,BULGARIA

来源：

ELECTROCHIMICA ACTA | 1993年 / 38卷 / 04期

关键词：

BARRIER LAYER SOLUTION INTERFACE; ELECTRICAL PROPERTIES; BISMUTH ELECTRODE; PHOTOCONDUCTIVITY; FILM BREAKDOWN;

D O I：

10.1016/0013-4686(93)85006-K

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The electric breakdown of anodic films on Bi in H3PO4 solutions was investigated using conventional galvanostatic and potentiostatic oxidation, as well as ac impedance, photocurrent and electrolyte conductivity measurements. A surface charges approach is advanced in order to explain both galvanostatic and potentiostatic breakdown phenomena and their relation with the ionic and electronic conduction of anodic oxide films. Proofs for the model are searched for in the experimental results obtained.

引用

页码：511 / 517

页数：7

共 19 条

[1] ANODIZATION AND BREAKDOWN MODEL OF TA2O5 FILMS [J].

ALBELLA, JM ;

MONTERO, I ;

MARTINEZDUART, JM .

THIN SOLID FILMS, 1985, 125 (1-2) :57-62

[2] ELECTRON INJECTION AND AVALANCHE DURING THE ANODIC-OXIDATION OF TANTALUM [J].

ALBELLA, JM ;

MONTERO, I ;

MARTINEZDUART, JM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (05) :1101-1104

[3] A THEORY OF AVALANCHE BREAKDOWN DURING ANODIC-OXIDATION [J].

ALBELLA, JM ;

MONTERO, I ;

MARTINEZDUART, JM .

ELECTROCHIMICA ACTA, 1987, 32 (02) :255-258

[4] IMPEDANCE MEASUREMENTS OF THE RELAXATION PHENOMENA IN THE BISMUTH ANODIC FILM ELECTROLYTE SYSTEM [J].

BOJINOV, M ;

KANAZIRSKI, I ;

GIRGINOV, A .

ELECTROCHIMICA ACTA, 1992, 37 (13) :2415-2420

[5] DIELECTRIC BREAKDOWN IN ELECTROLYTIC CAPACITORS [J].

BURGER, FJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (12) :2039-&

[6] INTERNAL PHOTOEMISSION AT THE BI/ANODIC BI2O3 INTERFACE [J].

CASTILLO, LM ;

PETER, LM .

JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1983, 146 (02) :377-384

[7]

Chao C.Y., 1981, J ELECTROCHEM SOC, V128, P1194

[8] IMPEDANCE MEASUREMENTS DURING ANODIZATION OF ALUMINUM [J].

DEWIT, HJ ;

WIJENBERG, C ;

CREVECOEUR, C .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (05) :779-785

[9]

DIQUARTO F, 1988, J ELECTROANAL CHEM, V298, P99

[10] THICKNESS INFLUENCE IN BREAKDOWN PHENOMENA OF THIN DIELECTRIC FILMS [J].

FORLANI, F ;

MINNAJA, N .

PHYSICA STATUS SOLIDI, 1964, 4 (02) :311-324

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