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QUANTITATIVE-EVALUATION OF THE ION-BEAM EFFECT DURING SPUTTERING OF OXIDE LAYERS USING AES AND XPS

被引：38
作者：
HOFMANN, S
SANZ, JM
机构：
来源：
FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE | 1983年 / 314卷 / 03期
关键词：
D O I：
10.1007/BF00516801
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
引用
收藏
页码：215 / 219
页数：5
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