CHARACTERISTICS OF HOLE TRAPS IN DRY AND PYROGENIC GATE OXIDES

被引：29

作者：

SHANFIELD, Z

MORIWAKI, MM

机构：

来源：

IEEE TRANSACTIONS ON NUCLEAR SCIENCE | 1984年 / 31卷 / 06期

关键词：

D O I：

10.1109/TNS.1984.4333490

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1242 / 1248

页数：7

共 28 条

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